Zeiss EC Plan-Neofluar 40x/1.30 Oil Immersion Objective (NA 1.30, Infinity, M27) ZEISS Semiconductor wafer and large substrate

Semiconductor wafer and large substrate inspection

providing numerical apertures of 1

Type: Infinity Corrected Brightfield Wavelength: Visible & NUV Magnification: 100x N

preventing movement during observation and allowing systematic scanning of the slide without losing specimen position

materials inspection

Zeiss EC Plan-Neofluar 40x/1.30 Oil Immersion Objective (NA 1.30, Infinity, M27) ZEISS Semiconductor wafer and large substrateThe Zeiss EC Plan Neofluar 40 1. 30 Oil Immersion Objective is a high performance fluorite oil immersion objective from Zeisss EC (Enhanced Contrast) Plan Neofluar series delivering NA 1. 30 resolution with minimized stray light and enhanced contrast across all imaging modalities including brightfield, darkfield, phase contrast, DIC, fluorescence, and polarization. Offered here in lightly used condition with perfect optics at significant savings