Olympus MXPLANFL N 20X Objective – 0.60 NA, 3 mm WD Plan Fluorite Brightfield SEMICONDUCTOR INSPECTION Three standard POL objectives —

Three standard POL objectives — 10x

and this configuration combines reflected and transmitted light polarized light capability with brightfield and darkfield contrast in a single

samples requiring environmental chambers

where the condenser NA must exceed the objective NA to maintain the darkfield condition

this objective is compatible with a broad range of upright microscope systems used in life science and material science workflows

Olympus MXPLANFL N 20X Objective – 0.60 NA, 3 mm WD Plan Fluorite Brightfield SEMICONDUCTOR INSPECTION Three standard POL objectives —Premium 20 semi apochromatic objective with ultra high 0. 60 numerical aperture and exceptional field flatness ideal for maximum resolution imaging, image stitching, and advanced industrial microscopy. Working Distance: 3mm 20 Magnification, NA 0. 60 Ultra high numerical aperture for maximum resolution and exceptional light gathering capability. Superior Field Flatness Exceptional image uniformity from center to edge, ideal for image stitching and